Article ; Online: Assessment of Active Dopants and p-n Junction Abruptness Using In Situ Biased 4D-STEM.
Nano letters
2022
Abstract: ... measure active dopants at the nanometer scale. In a p-n junction, the abruptness of the dopant profile ...
Abstract | A key issue in the development of high-performance semiconductor devices is the ability to properly measure active dopants at the nanometer scale. In a p-n junction, the abruptness of the dopant profile around the metallurgical junction directly influences the electric field. Here, a contacted nominally symmetric and highly doped ( |
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Language | English |
Publishing date | 2022-11-28 |
Publishing country | United States |
Document type | Journal Article |
ISSN | 1530-6992 |
ISSN (online) | 1530-6992 |
DOI | 10.1021/acs.nanolett.2c03684 |
Database | MEDical Literature Analysis and Retrieval System OnLINE |
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