Article ; Online: Etch characteristics of magnetic tunnel junction materials using H
2021 Volume 32, Issue 5, Page(s) 55301
Abstract: ... such as W and TiN were etched with a reactive ion beam etching (RIBE) system using H ...
Abstract | Magnetic tunneling junction (MTJ) materials such as CoFeB, Co, Pt, MgO, and the hard mask material such as W and TiN were etched with a reactive ion beam etching (RIBE) system using H |
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Language | English |
Publishing date | 2021-01-01 |
Publishing country | England |
Document type | Journal Article |
ZDB-ID | 1362365-5 |
ISSN | 1361-6528 ; 0957-4484 |
ISSN (online) | 1361-6528 |
ISSN | 0957-4484 |
DOI | 10.1088/1361-6528/abb04e |
Database | MEDical Literature Analysis and Retrieval System OnLINE |
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