Article: Improvement of AlGaN/GaN HEMTs Linearity Using Etched-Fin Gate Structure for Ka Band Applications.
2023 Volume 14, Issue 5
Abstract: ... fabricated to improve device linearity for Ka-band application are reported. Within the proposed study ... of wireless power amplifier components for Ka band applications. ...
Abstract | In this paper, AlGaN/GaN high electron mobility transistors (HEMTs) with etched-fin gate structures fabricated to improve device linearity for Ka-band application are reported. Within the proposed study of planar, one-etched-fin, four-etched-fin, and nine-etched-fin devices, which have 50-μm, 25-μm, 10-μm, and 5-μm partial gate widths, respectively, the four-etched-fin gate AlGaN/GaN HEMT devices have demonstrated optimized device linearity with respect to the extrinsic transconductance (Gm) value, the output third order intercept point (OIP3), and the third-order intermodulation output power (IMD3) level. The IMD3 is improved by 7 dB at 30 GHz for the 4 × 50 μm HEMT device. The OIP3 is found to reach a maximum value of 36.43 dBm with the four-etched-fin device, which exhibits high potential for the advancement of wireless power amplifier components for Ka band applications. |
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Language | English |
Publishing date | 2023-04-25 |
Publishing country | Switzerland |
Document type | Journal Article |
ZDB-ID | 2620864-7 |
ISSN | 2072-666X |
ISSN | 2072-666X |
DOI | 10.3390/mi14050931 |
Database | MEDical Literature Analysis and Retrieval System OnLINE |
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