Article: Effect of Co, Pd and Pt ultra-thin films on the Ni-silicide formation: investigating the sandwich configuration
Journal of materials science. 2022 Mar., v. 57, no. 10
2022
Abstract: The effect of Co, Pd and Pt ultrathin films on the kinetics of the formation of Ni-silicide by reactive diffusion is investigated. 50 nm Ni/1 nm X/ 50 nm Ni (X = Co, Pd, Pt) deposited on Si(100) substrates are studied using in-situ and ex-situ ... ...
Abstract | The effect of Co, Pd and Pt ultrathin films on the kinetics of the formation of Ni-silicide by reactive diffusion is investigated. 50 nm Ni/1 nm X/ 50 nm Ni (X = Co, Pd, Pt) deposited on Si(100) substrates are studied using in-situ and ex-situ measurements by X-ray diffraction (XRD). The presence of Co, Pd or Pt thin films in between the Ni layers delays the formation of the metal rich phase compared to the pure Ni/Si system and thus these films act as diffusion barriers. A simultaneous silicide formation (δ-Ni₂Si and NiSi phases) different from the classic sequential formation is found during the consumption of the top Ni layer for which Ni has to diffuse through the barrier. A model for the simultaneous growth in the presence of a barrier is developed, and simulation of the kinetics measured by XRD is used to determine the permeability of the different barriers. Atom probe tomography (APT) of the Ni/Pd/Ni system shows that the Pd layer is located between the Ni top layer and δ-Ni₂Si during the silicide growth, in accordance with a silicide formation controlled by Ni diffusion through the Pd layer. The effect of the barrier on the silicide formation and properties is discussed. |
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Keywords | X-ray diffraction ; models ; permeability ; tomography |
Language | English |
Dates of publication | 2022-03 |
Size | p. 5894-5912. |
Publishing place | Springer US |
Document type | Article |
ZDB-ID | 2015305-3 |
ISSN | 1573-4803 ; 0022-2461 |
ISSN (online) | 1573-4803 |
ISSN | 0022-2461 |
DOI | 10.1007/s10853-022-07012-2 |
Database | NAL-Catalogue (AGRICOLA) |
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