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  1. Article ; Online: Modulation of Structural, Electronic, and Optical Properties of Titanium Nitride Thin Films by Regulated In Situ Oxidation.

    Roy, Manosi / Sarkar, Kaushik / Som, Jacob / Pfeifer, Mark A / Craciun, Valentin / Schall, J David / Aravamudhan, Shyam / Wise, Frank W / Kumar, Dhananjay

    ACS applied materials & interfaces

    2023  Volume 15, Issue 3, Page(s) 4733–4742

    Abstract: Epitaxial titanium nitride (TiN) and titanium oxynitride (TiON) thin films have been grown on sapphire substrates using a pulsed laser deposition (PLD) method in high-vacuum conditions (base pressure <3 × ... ...

    Abstract Epitaxial titanium nitride (TiN) and titanium oxynitride (TiON) thin films have been grown on sapphire substrates using a pulsed laser deposition (PLD) method in high-vacuum conditions (base pressure <3 × 10
    Language English
    Publishing date 2023-01-10
    Publishing country United States
    Document type Journal Article
    ISSN 1944-8252
    ISSN (online) 1944-8252
    DOI 10.1021/acsami.2c18926
    Database MEDical Literature Analysis and Retrieval System OnLINE

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  2. Article ; Online: Modulation of Structural, Electronic, and Optical Properties of Titanium Nitride Thin Films by Regulated In Situ Oxidation

    Roy, Manosi / Sarkar, Kaushik / Som, Jacob / Pfeifer, Mark A. / Crăciun, V. / Schall, J. David / Aravamudhan, Shyam / Wise, Frank W. / Kumar, Dhananjay

    ACS Applied Materials & Interfaces. 2023 Jan. 10, v. 15, no. 3 p.4733-4742

    2023  

    Abstract: Epitaxial titanium nitride (TiN) and titanium oxynitride (TiON) thin films have been grown on sapphire substrates using a pulsed laser deposition (PLD) method in high-vacuum conditions (base pressure <3 × 10-⁶ T). This vacuum contains enough residual ... ...

    Abstract Epitaxial titanium nitride (TiN) and titanium oxynitride (TiON) thin films have been grown on sapphire substrates using a pulsed laser deposition (PLD) method in high-vacuum conditions (base pressure <3 × 10-⁶ T). This vacuum contains enough residual oxygen to allow a time-independent gas phase oxidation of the ablated species as well as a time-dependent regulated surface oxidation of TiN to TiON films. The time-dependent surface oxidation is controlled by means of film deposition time that, in turn, is controlled by changing the number of laser pulses impinging on the polycrystalline TiN target at a constant repetition rate. By changing the number of laser pulses from 150 to 5000, unoxidized (or negligibly oxidized) and oxidized TiN films have been obtained with the thickness in the range of four unit cells to 70 unit cells of TiN/TiON. X-ray photoelectron spectroscopy (XPS) investigations reveal higher oxygen content in TiON films prepared with a larger number of laser pulses. The oxidation of TiN films is achieved by precisely controlling the time of deposition, which affects the surface diffusion of oxygen to the TiN film lattice. The lattice constants of the TiON films obtained by x-ray diffraction (XRD) increase with the oxygen content in the film, as predicted by molecular dynamics (MD) simulations. The lattice constant increase is explained based on a larger electrostatic repulsive force due to unbalanced local charges in the vicinity of Ti vacancies and substitutional O. The bandgap of TiN and TiON films, measured using UV-visible spectroscopy, has an asymmetric V-shaped variation as a function of the number of pulses. The bandgap variation following the lower number of laser pulses (150-750) of the V-shaped curve is explained using the quantum confinement effect, while the bandgap variation following the higher number of laser pulses (1000-5000) is associated with the modification in the band structure due to hybridization of O₂ₚ and N₂ₚ energy levels.
    Keywords X-ray diffraction ; X-ray photoelectron spectroscopy ; energy ; hybridization ; molecular dynamics ; nitrides ; oxidation ; oxygen ; titanium ; ultraviolet-visible spectroscopy ; thin films ; pulsed laser deposition ; controlled oxidation ; bandgap energy ; oxynitrides ; transition metal nitrides
    Language English
    Dates of publication 2023-0110
    Size p. 4733-4742.
    Publishing place American Chemical Society
    Document type Article ; Online
    ISSN 1944-8252
    DOI 10.1021/acsami.2c18926
    Database NAL-Catalogue (AGRICOLA)

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  3. Article: Electrical and optical properties of titanium oxynitride thin films

    Mucha, Nikhil R / Som, Jacob / Shaji, Surabhi / Fialkova, Svitlana / Apte, Prakash R / Balasubramanian, Balamurugan / Shield, Jeffrey E / Anderson, Mark / Kumar, Dhananjay

    Journal of materials science. 2020 Apr., v. 55, no. 12

    2020  

    Abstract: A TiNxOy (TiNO) material system has been synthesized in thin film form for the first time using a pulsed laser deposition process. X-ray diffraction and X-ray photoelectron spectroscopy measurements have been carried out to show partial oxidation of TiN ... ...

    Abstract A TiNxOy (TiNO) material system has been synthesized in thin film form for the first time using a pulsed laser deposition process. X-ray diffraction and X-ray photoelectron spectroscopy measurements have been carried out to show partial oxidation of TiN to TiNO. The current (I)-voltage (V) characteristics recorded from TiNO films sandwiched between indium tin oxide (ITO) and gold (Au) layers and/or copper (Cu) electrodes have shown that the I–V curves lie in the first and third quadrants (i.e., both I and V are either positive or negative) in the dark conditions, while the I–V curves lie in the second and fourth quadrants (i.e., I and V with opposite sign) in the illuminated conditions. The positive sign of power (I × V = Positive) under dark conditions indicates dissipation of power in the TiNO system, while the negative sign of the power (I × V = Negative) under optical illumination indicates the power generation capability of TiNO system. The bandgap of the TiNO thin film samples, measured using ultra violet (UV)–visible (400–800 nm) spectroscopy, was found to be ~ 1.6 eV. As the number of photocatalysts/semiconductors that are active under the visible light irradiation is very limited, our approach to develop a unique visible-light-driven TiNO photoactive material system can open a new avenue for the realization of novel optical devices.
    Keywords X-ray diffraction ; X-ray photoelectron spectroscopy ; copper ; electrodes ; films (materials) ; gold ; indium tin oxide ; irradiation ; light ; lighting ; optical properties ; oxidation ; photocatalysts ; power generation ; semiconductors ; titanium
    Language English
    Dates of publication 2020-04
    Size p. 5123-5134.
    Publishing place Springer US
    Document type Article
    ZDB-ID 2015305-3
    ISSN 1573-4803 ; 0022-2461
    ISSN (online) 1573-4803
    ISSN 0022-2461
    DOI 10.1007/s10853-019-04278-x
    Database NAL-Catalogue (AGRICOLA)

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